超临界材料与电子实验室
Superctitical Materials and Electronics Laboratory

恭喜彭泽晖同学在知名期刊RSC advances发表期刊论文

时间:2024-09-06

恭喜彭泽晖同学在国际期刊RSC advances上发表了题为" Constructing drain surrounded double gate structure in AlGaN/GaN HEMT for boosting breakdown voltage"的期刊论文.

网页链接:10.1039/D4RA03508A