The students of our laboratory attended AM-FPD Conference

The 22nd International Workshop on Active-Matrix Flat Panel Displays and Devices -TFT Technologies and FPD Materials- (AM-FPD ’15) has been held in Ryukoku University Avanti Kyoto Hall, Kyoto, Japan from July 1 to 3, 2015. Guoying Wang and Zhen Song were master graduate students in our lab and attended the meeting. They published academic papers and introduced the latest research results in BCE-IGZO TFT process and reliability in our TFT&SOP laboratory.

AMFPD'15 discussed two aspects such as TFT technology and flat panel displays. The AMFPD conference was mainly composed of two parts, the academic seminar and the technical exhibition. In addition to the regular sessions, there will be three symposia, “Advances in TFT Technology for Future Application”, “Emerging Flexible Solar Cells” and “2D Materials for Flexible Electronics”, in which innovative and important technologies for future TFT, transparent conductive films, and photovoltaics.

AM-FPD'15 has prepared an attractive program focusing on “New Stages of Thin Film Devices towards Flexible Era” at the areas of thin film technologies such as thin-film transistors (TFTs), other thin-film devices, photovoltaics, circuitries and systems, LC technology, and crystallization, thin film materials and devices. The workshop has provided the keynote addresses by Ms. Lori L. Hamilton (Corning Holding Japan G.K., Japan) and Prof. Michio Kondo (Nat'l Inst. of Advanced Industrial Sci. and Technol., Japan).

In the exhibition area, there were a variety of flexible high resolution displays,such as Ultra-Thin and High Resolution OLED Display；there were several displays for mobile applications, such as Innovation Vehicle SID 2015 for mobile and so on.

In this conference, our lab have published an academic paper on oxide thin film transistors, that was“Over-etching Time on the Performance of a-IGZO TFT with Back-Channel-Etch Structure ”. This paper has introduced the research background and problems of BCE-IGZO TFT in dry etching process, and the effect of different over-etching times on the performance of the device.

Through this meeting, it is advantageous for us to further understand the development of the latest technology in the field, and to have a new understanding of our research work.