Wang Research Group


Our research focuses on Atomic Layer Deposition (ALD) and its applications.

(1) We synthesize ALD precursors (metal organic compounds) and develop deposition recipes for various thin film materials, with the focus of transition metal oxides, nitrides, sulfides, as well as the pure metals.

(2) We perform in-situ measurements to investigate the surface chemistry involved in the deposition processes.

(3) We also work on various applications of the ALD films (e.g. for solar cells, batteries, catalysis, microelectronic devices, etc.).